What is hardmask?

A hardmask is a layer of material that is used during the fabrication process of semiconductors and microelectronics. It is a thin layer of material that can withstand the etching process used to create patterns on the substrate. Hardmasks are often made of materials such as silicon dioxide, silicon nitride, or a combination of these materials.

The use of a hardmask helps to improve the precision and accuracy of the fabrication process. It allows for the creation of smaller and more complex patterns on the substrate, which can lead to increased device performance and functionality. Hardmasks also protect the underlying substrate from damage during the etching process.

There are two types of hardmasks: thermally grown and deposited. Thermally grown hardmasks are created by heating the substrate in a specific type of furnace, which causes a layer of silicon dioxide or silicon nitride to grow on the substrate. Deposited hardmasks are created by depositing a layer of material onto the substrate using a process such as chemical vapor deposition (CVD).

Overall, hardmasks are an important component of the semiconductor and microelectronics fabrication process, helping to ensure precise and accurate patterning of the substrate.