SIF4 refers to Silicon tetrafluoride, which is a chemical compound formed by the combination of one silicon atom and four fluorine atoms. It is a colorless, pungent-smelling gas that is highly reactive, particularly with water and other chemicals that contain hydroxyl groups.
SIF4 has a tetrahedral shape, with the silicon atom at the center and the four fluorine atoms occupying the four corners of the tetrahedron. It is commonly used in the manufacture of semiconductors, as a fluorinating agent, and in the production of glass and ceramics.
This compound is a strong oxidizing agent and can cause severe burns and corrosion upon contact with living tissues. Therefore, it requires careful handling and storage. Its boiling point is -65℃ and its melting point is -90℃. SIF4 is one of the more stable silicon halides and has been used to enable deposition of thin films of silicon oxide.
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